Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2007-10-19
2011-10-04
Chen, Jack (Department: 2893)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S237000, C438S455000, C438S458000, C438S528000, C257SE21002
Reexamination Certificate
active
08030118
ABSTRACT:
A method for producing a single crystal silicon solar cell including the steps of: implanting ions into a single crystal silicon substrate through an ion implanting surface thereof; closely contacting the single crystal silicon substrate and a transparent insulator substrate with each other via a transparent electroconductive adhesive while using the ion implanting surface as a bonding surface; curing and maturing the transparent electroconductive adhesive into a transparent electroconductive film; applying an impact to the ion implanted layer to mechanically delaminate the single crystal silicon substrate to leave a single crystal silicon layer; and forming a p-n junction in the single crystal silicon layer.
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Akiyama Shoji
Ito Atsuo
Kawai Makoto
Kubota Yoshihiro
Tanaka Koichi
Chen Jack
Oliff & Berridg,e PLC
Shin-Etsu Chemical Co. , Ltd.
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