Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – Forming a platelet shape or a small diameter – elongate,...
Patent
1995-04-14
1996-08-13
Garrett, Felisa C.
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
Forming a platelet shape or a small diameter, elongate,...
117 75, 117921, C30B 2504
Patent
active
055446175
ABSTRACT:
A method for producing a single crystal, which comprises (1) placing a metal layer as a pattern at a desired position on the surface of a single crystal substrate, (2) etching the surface of the single crystal substrate around the pattern, and (3) in a raw material gas atmosphere containing an element or elements constituting the single crystal, taking the element or elements in the metal layer at the pattern and permitting a needle-like single crystal to grow perpendicularly.
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Zaima et al, J. Phys. D: Appl. Phys., vol. 13, pp. L47-49 (1980).
Terasaki Ryuichi
Terui Yoshinori
Denki Kagaku Kogyo Kabushiki Kaisha
Garrett Felisa C.
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