Method for producing silicon substrate for solar cells

Details Method for producing silicon substrate for solar cells Method for producing silicon substrate for solar cells

2008-06-16

2011-11-08

Deo, Duy (Department: 1713)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S072000, C438S745000

Reexamination Certificate

active

08053270

ABSTRACT:
A method for producing a silicon substrate for solar cells is provided. The method includes performing a saw damage removal (SDR) and surface macro-texturing on a silicon substrate with acids solution, so that a surface of the silicon substrate becomes an irregular surface. Thereafter, a metal-activated selective oxidation is performed on the irregular surface with an aqueous solution containing an oxidant and a metal salt, in which the oxidant is one selected from persulfate ion, permanganate ion, bichromate ion, and a mixture thereof. Afterwards, the irregular surface is etched with an aqueous solution containing HF and H2O2so as to form a nano-texturized silicon substrate.

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Hadjersi et al. Metal-assisted chemical etching in HF/Na2S2O8 or HF/KMnO4 produces porous silicon, Mar. 5, 2004, Thin Solid Films, 459, p. 271-275.
Kolasinski, Silicon nanostructures from electroless electrochemical etching, 2005, Solid State and Materials Science, 9, p. 73-83.
Douauni et al. Formation of aligned silicon-nanowire on silicon in aqueous HF/(AgNO3+Na2S2O8) solution, May 20, 2008, Applied Surface Science, 254, p. 7219-7222.
Article titled “Metal-Assisted Wet Chemical Etching of Crystalline Silicon” authored by Chartier, et al., 22nd European Photovoltaic Solar Energy Conference, Sep. 3-7, 2007, Milan, Italy pp. 1231-1234.

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