Method for producing silicon coating having high surface area

Coating processes – Spray coating utilizing flame or plasma heat – Nonuniform or patterned coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427452, 427456, 427343, 427352, 427224, 427225, B05D 132, B05D 108

Patent

active

057310416

ABSTRACT:
The invention is to a method for producing a high surface substrate. A mask is positioned (31) over a substrate to define a deposition area. Thereafter at least two dissimilar materials are simultaneously deposited (32) through the mask onto the deposition area. Then one of the deposited materials is selectively removed (33) to provide a high surface area deposited substrate.

REFERENCES:
patent: 4181585 (1980-01-01), Pangborn
patent: 4184941 (1980-01-01), Cavlin
patent: 4279709 (1981-07-01), McIntyre et al.
patent: 4331703 (1982-05-01), Lindmayer
patent: 4392010 (1983-07-01), Lindmayer
patent: 4666743 (1987-05-01), Ohta et al.
patent: 4753849 (1988-06-01), Zohler
patent: 4759957 (1988-07-01), Eaton et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing silicon coating having high surface area does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing silicon coating having high surface area, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing silicon coating having high surface area will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2287050

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.