Glass manufacturing – Processes – With measuring – sensing – inspecting – indicating – or testing
Patent
1981-01-21
1982-03-02
McCarthy, Helen M.
Glass manufacturing
Processes
With measuring, sensing, inspecting, indicating, or testing
65 32, 65 301, 264332, 423338, 501 12, 501 54, C03B 1906, C01B 3312
Patent
active
043176682
ABSTRACT:
A method for producing silica glass wherein a dry silica gel subjected to a water desorption treatment and a carbon removal treatment is heated and has its temperature raised in an atmosphere containing chlorine, to perform a hydroxyl group removal treatment, the resultant silica gel is thereafter heated to a temperature of approximately 1,000.degree. C.-1,100.degree. C. in an atmosphere containing at least 1% of oxygen, to perform a chlorine removal treatment, and the resultant silica gel is further heated to a temperature of 1,050.degree. C.-1,300.degree. C. in He or in vacuum, to perform a sintering treatment. The silica glass thus produced does not form bubbles even when heated to high temperatures of or above 1,300.degree. C. Therefore, it is easily worked and it is free from the lowering of transparency attributed to the bubble formation.
REFERENCES:
patent: 4116657 (1978-09-01), Elmer
patent: 4165223 (1979-08-01), Powers
patent: 4243422 (1981-01-01), Lenz et al.
Yamane, M. et al., "Low Temperature Synthesis of a Monolithic Silica Glass by the Pyrolysis of a Silica Gel", J. Material Sciences 14 (1979), pp. 607-611.
Pastor, R. C. et al., "Crystal Growth in a Reactive Atmosphere", Mat. Res. Bull. 10 (1975), pp. 117-124.
Matsuyama Iwao
Satoh Shin
Suganuma Tsuneo
Susa Kenzo
Hitachi , Ltd.
McCarthy Helen M.
LandOfFree
Method for producing silica glass does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing silica glass, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing silica glass will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-58566