Method for producing scatter lines in mask structures for...

Details Method for producing scatter lines in mask structures for... Method for producing scatter lines in mask structures for...

2005-01-04

2005-01-04

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C716S030000

Reexamination Certificate

active

06838212

ABSTRACT:
In the method according to the invention, scatter lines (2, 3, 4, 5, 6, 7, 8) with a predetermined width are produced, which run at a predetermined distance from selected edges of mask structure elements (1). These scatter lines (2, 3, 4, 5, 6, 7, 8) produced are inspected with regard to compliance with a predetermined distance from adjoining edges of mask structure elements (1) and with regard to compliance with a predetermined distance from one another. Scatter lines (2, 3, 4, 5, 6, 7, 8) which fall below the predetermined distance are shortened and/or eliminated.

REFERENCES:
patent: 6074787 (2000-06-01), Takeuchi
patent: 6099992 (2000-08-01), Motoyama et al.
patent: 6197452 (2001-03-01), Matumoto

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