Method for producing polycrystalline ribbon

Details Method for producing polycrystalline ribbon Method for producing polycrystalline ribbon

1980-06-30

1981-09-29

Pavelko, Thomas P.

Plastic and nonmetallic article shaping or treating: processes

Gas or vapor deposition of article forming material onto...

156613, 264166, B29C 1304

Patent

active

042922640

ABSTRACT:
A method for the substantially continuous growth of polycrystalline silicon ribbon. The polycrystalline silicon is chemically vapor deposited on elongated foils which move slowly through a resistance heated furnace chamber. Vapor sealing entrance and exit ports are provided which allow the continuous transfer of the foils and polycrystalline ribbon between the chamber and the ambient. The foils are positioned within the chamber so as to mask the chamber walls and to restrict the deposition to the foils. All deposition of polycrystalline silicon takes place on one side of each of the foil pieces; deposition on the edges or backs of the foils is prevented by the positioning of the foils relative to each other. Adhesion of the foils to each other is prevented by insuring that all foils are in relative motion. The process is highly efficient and cost effective because it employs efficient resistance heating, because the only surfaces which the reactant gases can contact are hot and are regions of desired deposition, and because the length of the reaction zone can be made long enough to obtain an optimum amount of gas reaction.

REFERENCES:
patent: 4035460 (1977-07-01), Dietze
patent: 4065533 (1977-12-01), Koppl

Affiliated with

Also associated with

Rating

Method for producing polycrystalline ribbon does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing polycrystalline ribbon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing polycrystalline ribbon will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1233584