Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Process of making radiation-sensitive product
Patent
1982-06-10
1984-03-20
Martin, Jr., Roland E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Process of making radiation-sensitive product
430133, 430136, 427 39, G03G 5082
Patent
active
044381883
ABSTRACT:
Disclosed are method and apparatus for producing highly uniform films of photosensitive materials (e.g., amorphous silicon) for electrophotography on large diameter cylindrical metal substrates (e.g., aluminum or stainless steel) by plasma chemical vapor deposition (CVD). The cylindrical substrate is rotatably mounted in a reaction chamber and serves as an electrode. A hollow metallic second electrode in the reaction chamber coaxially surrounds the substrate and is spaced apart therefrom. Hydrogen gas is first introduced into the inter-electrode space between the substrate and the second electrodes, and a high-frequency electric field is applied to the two electrodes to generate a glow discharge for plasma cleaning of the substrate surface. The hydrogen gas is then pumped out of the reaction chamber, and a reaction gas of monosilane (SiH.sub.4) is then flowed through the inter-electrode space and a glow discharge is again generated between the electrodes to decompose the silane and to cause amorphous silicon to deposit on the surface of the substrate. During deposition both the substrate and the second electrode are electrically heated. The reaction gas is introduced and exhausted in a manner such that reaction gas density in the inter-electrode space is uniform along the axial direction.
REFERENCES:
patent: 4225222 (1980-09-01), Kempter
patent: 4325986 (1982-04-01), Baron et al.
Res. Discl. 17354, "Silicon Device with Uniformly Thick Polysilicon", Sep. 1978, pp. 52-53.
Kazama Toyoki
Shimatani Michiro
Fuji Electric Company Ltd.
Martin Jr. Roland E.
LandOfFree
Method for producing photosensitive film for electrophotography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing photosensitive film for electrophotography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing photosensitive film for electrophotography will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1604581