Method for producing phase shifter masks

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S296000

Reexamination Certificate

active

11252476

ABSTRACT:
The invention relates to a method for producing phase shifter masks for 157 nm lithography. A coating has an organic material and is at least partially configured on the phase shifter mask. This coating is processed with an electron beam. This allows efficient production of very small structures, even for 157 nm lithography.

REFERENCES:
patent: 4197332 (1980-04-01), Broers et al.
patent: 4550257 (1985-10-01), Binnig et al.
patent: 4698236 (1987-10-01), Kellogg et al.
patent: 5147823 (1992-09-01), Ishibashi et al.
patent: 5429730 (1995-07-01), Nakamura et al.
patent: 5477058 (1995-12-01), Sato
patent: 6387602 (2002-05-01), Hayden et al.
patent: 6836371 (2004-12-01), Lai et al.
patent: 2003/0047691 (2003-03-01), Musil et al.
patent: 0 168 510 (1986-01-01), None
patent: 0 304 969 (1989-03-01), None
patent: 53 135 276 (1978-11-01), None
patent: 61 025 146 (1986-02-01), None
patent: 03/012551 (2003-02-01), None
Budavari, Susan, Editor, et al., The Merck Index, An Encyclopedia of Chemicals, Drugs, and Biologicals, 1989, Merck & Co., Inc., 11th Edition (Centennial Edition), pp. 1346-1347 (8442. Silicones).
I. Utke, et al.: “Microelectronic Engineering 53 (2000)”, pp. 261-264.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing phase shifter masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing phase shifter masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing phase shifter masks will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3783465

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.