Method for producing optically transparent regions in a...

Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface...

Reexamination Certificate

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C205S646000, C257SE21215, C257SE21232

Reexamination Certificate

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07419581

ABSTRACT:
A simple and cost-effective possibility is proposed for producing optically transparent regions (5, 6) in a silicon substrate (1), by the use of which both optically transparent regions of any thickness and optically transparent regions over a cavity in a silicon substrate are able to be implemented.For this purpose, first at least a specified region (5, 6) of the silicon substrate (1) is etched porous. Thereafter, the specified porous region (5, 6) of the silicon substrate (1) is oxidized.

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G. Lammel et al., “Free-standing, mobile 3D porous silicon microstructures,” Swiss Fed. Inst. Of Technology, Laussanne, Switzerland, Elsevier Science, Sensor and Actuators 85 (2000) pp. 356-360.

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