Method for producing non-monocrystalline semiconductor device an

Details Method for producing non-monocrystalline semiconductor device an Method for producing non-monocrystalline semiconductor device an

1992-05-20

1994-06-28

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723E, 118723I, 118728, C23C 1650

Patent

active

053243609

ABSTRACT:
An apparatus for producing a non-monocrystalline semiconductor device having two film forming chambers. The apparatus has means for transferring a substrate from one film forming chamber to the other film forming chamber while maintaining the first film forming chamber in a plasma atmosphere.

REFERENCES:
patent: 4664951 (1987-05-01), Doehler
patent: 5180434 (1993-01-01), DiDio et al.

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