Method for producing nanometer order dot pattern by electron hol

Details Method for producing nanometer order dot pattern by electron hol Method for producing nanometer order dot pattern by electron hol

1994-07-29

1995-11-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Holographic process, composition, or product

430 2, 430942, 359 1, 359 3, 250306, 250307, 250311, H01L 2120

Patent

active

054665485

ABSTRACT:
In a nanometer order dot pattern producing method and drawing apparatus by electron holography, a nanometer order dot pattern is readily produced with a high accuracy, using a pair of biprisms or multi-biprisms integrated as a unit so as to mutually cross. Each multi-biprism includes a plurality of biprisms arranged in parallel. Electric potentials of the integrated biprisms or multi-biprisms are independently controlled.

REFERENCES:
patent: 4935625 (1990-06-01), Hasegawa et al.
patent: 4998788 (1991-03-01), Osakabe et al.
patent: 5298747 (1994-03-01), Ichikawa et al.

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