Method for producing multilayer optical device

Details Method for producing multilayer optical device Method for producing multilayer optical device

2006-11-30

2009-06-09

Xu, Ling (Department: 1794)

Coating processes

Applying superposed diverse coating or coating a coated base

Metallic compound-containing coating

C427S162000, C427S419300

Reexamination Certificate

active

07544392

ABSTRACT:
A film of aluminum2is formed on a glass substrate (BK7)1by vacuum evaporation, and a multilayer optical thin film3is formed by an ion sputtering method on this aluminum film2. Afterwards, such a member is cut into small pieces by means of dicing, and the aluminum2is then etched by a sodium hydroxide solution, so that the glass substrate1and the multilayer optical thin film3are separated. When the aluminum thickness exceeds 90 nm, clouding occurs in the multilayer optical thin film3, and when the aluminum thickness is less than 10 nm, the separation of the glass substrate and multilayer optical thin film cannot be performed cleanly. Accordingly, the aluminum thickness is set in a range of 10 to 90 nm.

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Translation of JP-03-196001.

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