Method for producing ink jet head by multiple development of pho

Details Method for producing ink jet head by multiple development of pho Method for producing ink jet head by multiple development of pho

1993-06-24

1996-06-11

Dang, Thi

Etching a substrate: processes

Forming or treating thermal ink jet article

430320, 430324, 430326, 430394, 430328, B41C 100, G03F 700

Patent

active

055247849

ABSTRACT:
A method for producing an ink jet head substrate with an ink passage communicated to an ink discharge opening comprises the steps of exposing a positive type photosensitive resin on a substrate according to the pattern of the ink passage and developing part of the resin according to the pattern of the ink passage. The remaining resin matching the pattern of the ink passage is then further exposed and developed and the resulting gap in the pattern is filled with material for forming the ink passage. The rest of the resin is then removed to form the ink passage which, because of the multiple exposing and developing steps, provides an ink jet head with an ink passage of high precision.

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