Etching a substrate: processes – Forming or treating josephson junction article
Patent
1994-11-28
1997-02-04
Wright, Lee C.
Etching a substrate: processes
Forming or treating josephson junction article
216 49, 216101, 216108, 505329, 505410, 505728, B05D 512, H01L 3922
Patent
active
055994652
ABSTRACT:
A method is provided for producing superconducting Josephson devices using a chemical etching solution which comprises forming a mask on a predetermined portion of a MgO substrate, and immersing the MgO substrate having the mask in an aqueous acid solution in which the volume ratio of phosphoric acid to sulfuric acid is approximately 10:1 or more, so as to form a step at the boundary between the masked region and the unmasked region.
REFERENCES:
patent: 4106975 (1978-08-01), Berkenblit et al.
patent: 4246328 (1981-01-01), Sato et al.
patent: 5196395 (1993-03-01), James et al.
patent: 5446016 (1995-08-01), Tanaka et al.
Hong Jin P.
Park Chan H.
Samsung Electro-Mechanics Co. Ltd.
Wright Lee C.
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