Method for producing heat-resistant synthetic quartz glass

Glass manufacturing – Processes – With shaping of particulate material and subsequent fusing...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

65 176, 65 301, 65 63, 65 64, 65111, 65424, 65474, C03B 1901, C03B 1909, C03B 3700, C03C 1500

Patent

active

057662916

ABSTRACT:
A porous silica body with a density of 0.1 g/cm.sup.3 to 0.5 g/cm.sup.3 and a density variation of less than 30% is subjected to a first heat-treatment in an ammonia-containing atmosphere, a second heat-sintering in non-oxidizing atmosphere, and further heat-treatment at a temperature in the range of 1400.degree. C. to 2000.degree. C. under an increased pressure of 500 kg/cm.sup.2 or more in a non-oxidizing atmosphere.

REFERENCES:
patent: 3113008 (1963-12-01), Elmer
patent: 4414014 (1983-11-01), Bruning et al.
patent: 4938788 (1990-07-01), Segawa et al.
patent: 4961767 (1990-10-01), Schermerhorn et al.
patent: 5045508 (1991-09-01), Brow et al.
patent: 5126081 (1992-06-01), Willingham et al.
patent: 5410428 (1995-04-01), Yamagata et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing heat-resistant synthetic quartz glass does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing heat-resistant synthetic quartz glass, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing heat-resistant synthetic quartz glass will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1719778

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.