Method for producing flat CVD diamond film

Details Method for producing flat CVD diamond film Method for producing flat CVD diamond film

1991-12-13

1993-12-14

Dang, Thi

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

4272551, 4272552, C23C 1600

Patent

active

052700771

ABSTRACT:
A chemical vapor deposition method for producing a flat diamond film substantially free of cracks by forming the diamond film on the surface of a substrate having a convex growth surface wherein the radius of curvature is matched with the tensile stress within the diamond coating produced to compensate for distortion when the film is separated from the substrate.

REFERENCES:
patent: 4707384 (1987-11-01), Schachner et al.
patent: 4987002 (1991-01-01), Sakamoto et al.
patent: 5006203 (1991-04-01), Purdes
patent: 5114745 (1992-05-01), Jones

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