Method for producing films of uniform thickness by ion-assisted

Details Method for producing films of uniform thickness by ion-assisted Method for producing films of uniform thickness by ion-assisted

1996-06-17

1998-08-04

Beck, Shrive P.

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427566, 4272481, C23C 1424

Patent

active

057890412

ABSTRACT:
A method for depositing thin films of improved uniformity on solid objects y the technique of ion-beam assisted deposition. In the ion-beam deposition technique, the surface of a solid substrate is exposed both to a stream of atoms or molecules evaporated from a crucible placed below the substrate and to a beam of ions. The most uniform films are deposited on the substrate when the evaporated particles are emitted in a particular angular direction that depends on the angle of tilt of the substrate. An improved method is disclosed for placing the substrate in a particular angular position relative to the evaporation source. Surface properties such as friction, wear life, surface hardness and resistance to corrosion of many types solid objects can be improved by coating their surfaces with a thin film using this technique.

REFERENCES:
patent: 4828870 (1989-05-01), Ando et al.
patent: 4992298 (1991-02-01), Deutchman et al.
patent: 5246741 (1993-09-01), Ouhata et al.

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