Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Treating process fluid by means other than agitation or...
Patent
1994-12-23
1996-04-02
Niebling, John
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Treating process fluid by means other than agitation or...
205 99, 205123, 205124, 205157, 205333, C25D 502
Patent
active
055037313
ABSTRACT:
A first pair electrodes consisting of an anode to which a plurality of wiring lines to be anodized are connected and a cathode that is opposed to the anode, and a second pair electrodes for collecting impurities in a forming solution are immersed in a forming solution. A voltage is applied to the plurality of wiring lines in such a manner that at least one of the plurality of wiring lines receives the voltage for a different period than the other wiring lines.
REFERENCES:
patent: 5270229 (1993-12-01), Ishihara
patent: 5359206 (1994-10-01), Yamamoto
Hiroki Masaaki
Konuma Toshimitsu
Koyama Jun
Yamazaki Shunpei
Costellia Jeffrey L.
Ferguson Jr. Gerald J.
Mee Brendan
Niebling John
Semiconductor Energy Laboratory Co,. Ltd.
LandOfFree
Method for producing electrodes of semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing electrodes of semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing electrodes of semiconductor device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2014176