Organic compounds -- part of the class 532-570 series – Organic compounds – Amino nitrogen containing
Reexamination Certificate
2006-06-27
2006-06-27
Richter, Johann (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Amino nitrogen containing
Reexamination Certificate
active
07067699
ABSTRACT:
In producing cyclohexanone oxime by a method comprising the step of reacting cyclohexanone, hydrogen peroxide and ammonia in the presence of titanium silicate, a brand-new titanium silicate and a recycled titanium silicate which has been recovered from a production method of cyclohexanone oxime are used. In accordance with the present invention, cyclohexanone is subjected to ammoximation by hydrogen peroxide and ammonia with suppressing the degradation- of titanium silicate as a catalyst, to produce cyclohexanone oxime with a high yield.
REFERENCES:
patent: 4745221 (1988-05-01), Roffia et al.
patent: 5227525 (1993-07-01), Tonti et al.
patent: 5312987 (1994-05-01), Mantegazza et al.
patent: 5451701 (1995-09-01), Zajacek et al.
patent: 5498793 (1996-03-01), Mantegazza et al.
patent: 5599987 (1997-02-01), Crocco et al.
patent: 5683952 (1997-11-01), Onozawa et al.
patent: 5736479 (1998-04-01), Schodel et al.
patent: 2003/0228970 (2003-12-01), Sun et al.
patent: 0 690 045 (1996-01-01), None
patent: 0 735 017 (1996-10-01), None
patent: EP 0 496 385 (1992-07-01), None
patent: EP 0 564 040 (1993-10-01), None
patent: 6-49015 (1994-02-01), None
patent: 6-92922 (1994-04-01), None
patent: 6-259256 (1994-09-01), None
patent: 7-100387 (1995-04-01), None
patent: EP 1 375 473 (2004-01-01), None
Fukao Masami
Oikawa Miyuki
LandOfFree
Method for producing cyclohexanone oxime does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing cyclohexanone oxime, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing cyclohexanone oxime will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3706284