Method for producing CVD diamond film substantially free of ther

Details Method for producing CVD diamond film substantially free of ther Method for producing CVD diamond film substantially free of ther

1991-12-13

1994-02-15

Dang, Thi

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

4272552, 156655, B05D 500

Patent

active

052865240

ABSTRACT:
Chemical vapor deposition method for producing a diamond film substantially free of thermal stress-induced cracks in which diamond growth occurs on both sides of a thin substrate so that two diamond coatings with identical opposing tensile forces are formed on each side of the substrate at a thickness greater than the thickness of the thin substrate.

REFERENCES:
patent: 4707384 (1987-11-01), Schachner et al.
patent: 4941942 (1990-07-01), Bruns et al.
patent: 5114745 (1992-05-01), Jones
patent: 5124179 (1992-06-01), Garg et al.

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