Method for producing carbon surface films by plasma exposure...

Details Method for producing carbon surface films by plasma exposure... Method for producing carbon surface films by plasma exposure...

2007-07-10

2007-07-10

Fletcher, III, William Phillip (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C427S569000, C427S249100

Reexamination Certificate

active

10954455

ABSTRACT:
Reactive halogen-ion plasmas, having for example, generating chloride ions, generated from low-pressure halogen gases using a radio-frequency plasma are employed for producing low-friction carbon coatings, such as a pure carbon film, at or near room temperature on a bulk or thin film of a compound, such as titanium carbide.

REFERENCES:
patent: 5002631 (1991-03-01), Giapis et al.
patent: 5788799 (1998-08-01), Steger et al.
patent: 6579833 (2003-06-01), McNallan et al.
patent: 01223733 (1989-09-01), None
patent: 02080300 (1990-03-01), None
Pierson, H. “Handbook of Chemical Vapor Deposition” 1992, Noyes Publications, p. 98.

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