Method for producing and using a positive photoresist with o-qui

Details Method for producing and using a positive photoresist with o-qui Method for producing and using a positive photoresist with o-qui

1990-03-28

1991-11-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430168, 430191, 430326, G03F 730, G03F 7022, G03F 7023

Patent

active

050665618

ABSTRACT:
The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate on a substrate, drying, exposing to imaging energy and developing.

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