Method for producing an oxide magnetic material

Details Method for producing an oxide magnetic material Method for producing an oxide magnetic material

2006-07-04

2006-07-04

Lopez, Carlos (Department: 1731)

Plastic and nonmetallic article shaping or treating: processes

Outside of mold sintering or vitrifying of shaped inorganic...

Of magnetic article or component

C264S658000

Reexamination Certificate

active

07070732

ABSTRACT:
An oxide magnetic material comprising main constituents including Fe2O3, ZnO, CuO and NiO. Y2O3of 0.003 to 0.021 wt % and-ZrO2of 0.06 to 0.37 wt % are included in main constituents with respect to all amounts. It is also preferable that Si of 0.010 to 0.0112 wt % is included in main constituents with respect to all amounts. Further, it is also preferable that Y2O3of 0.001 to 0.011 wt % , ZrO2of 0.031 to 0.194 wt %, and Si of 0.010 to 0.056 wt % are included in main constituents with respect to all amounts.

REFERENCES:
patent: 5716565 (1998-02-01), Stangle et al.
patent: 5945902 (1999-08-01), Lipkes et al.
patent: 6183659 (2001-02-01), Murayama et al.
patent: 6189202 (2001-02-01), Masuda et al.
patent: 6485840 (2002-11-01), Ito et al.
patent: 6558807 (2003-05-01), Ito et al.
patent: 1137156 (1996-12-01), None
patent: 06-181114 (1994-06-01), None
patent: 7-133150 (1995-05-01), None
patent: 2708160 (1997-10-01), None
Saburou Hori, “Strong Zirconia —Tough Ceramics”, Issued from Uchida Roukakuen, Nov. 30, 1990. pp. 57-69.
Ohnishi, Hiroshi, et al., “Zirconia Grinding and Dispersing Media”, New Ceramics, vol. 9, No. 5, pp. 31-36 (1996).

Affiliated with

Also associated with

Rating

Method for producing an oxide magnetic material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing an oxide magnetic material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing an oxide magnetic material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3610651