Method for producing an optoelectronic component

Details Method for producing an optoelectronic component Method for producing an optoelectronic component

2007-06-04

2010-06-22

Doan, Jennifer (Department: 2874)

Optical waveguides

Miscellaneous

C385S014000, C438S024000, C438S039000, C438S048000, C438S739000, C438S947000

Reexamination Certificate

active

07742677

ABSTRACT:
A method for producing an optoelectronic component is disclosed. The method includes the steps of providing a substrate, applying a semiconductor layer sequence to the substrate, applying at least two current expansion layers to the semiconductor layer sequence, applying and patterning a mask layer, patterning the second current expansion layer by means of an etching process during which sidewalls of the mask layer are undercut, patterning the first current expansion layer by means of an etching process during which the sidewalls of the mask layer are undercut at least to a lesser extent than during the patterning of the second current expansion layer, and removing the mask layer.

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