Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1979-06-20
1982-03-30
Gantz, Delbert E.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192R, 350164, 428472, C23C 1500
Patent
active
043222765
ABSTRACT:
A sputtered thin film coating characterized by a stepwise and/or variable refractive index as a function of film depth. By means of an in-line assembly of planar magnetrons, each magnetron essentially isolated from the others but for a region of sputtering overlap, select materials and combinations of said materials with reactive gases can be continuously deposited upon a dynamic substrate whereby to obtain pre-determined refractive index gradients. Substrates coated with an inhomogeneous thin film exhibit superior non-spectral reflective characteristics particularly desirable for architectural designs and applications.
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Meckel Benjamin B.
Meckel Nathan K.
Deposition Technology, Inc.
Gantz Delbert E.
Leader William
Slonecker Michael L.
Verbeck Bruno J.
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