Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product
Reexamination Certificate
2007-07-10
2007-07-10
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Holographic process, composition, or product
C430S010000, C430S011000, C430S015000, C430S022000, C430S273100, C430S290000, C430S296000, C430S327000, C430S328000
Reexamination Certificate
active
10545195
ABSTRACT:
Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced.
REFERENCES:
patent: 4255514 (1981-03-01), Kane
patent: 4282308 (1981-08-01), Cohen et al.
patent: 5252414 (1993-10-01), Yamashita et al.
patent: 5733708 (1998-03-01), Catanzaro et al.
patent: 5944974 (1999-08-01), Fahrenberg et al.
patent: 6337163 (2002-01-01), Sato
patent: 6905802 (2005-06-01), Lin
patent: 3837874 (1990-05-01), None
patent: 19524099 (1997-01-01), None
patent: 1225477 (2002-07-01), None
patent: 1321890 (2003-06-01), None
patent: 02187012 (1990-07-01), None
patent: 02262319 (1990-10-01), None
patent: 2001135565 (2001-05-01), None
patent: 01/20402 (2001-03-01), None
patent: PCT/EP2004/001816 (2005-06-01), None
Utaka K. et al., “Iambda!/4-shifted InGaAsP/InP DFB lasers by simultaneous holographic exposure of positie and negative photoresists”, XP002312959, Electronics Letters UK, Nov. 22, 1984, vol. 20; pp. 1008-1010.
Krauss P. R. et al., “Nano-campact disks with 400 Gbit/in<2> storage fabricated using nanoimprint lithography and read with proximal probe”, XP002330220, Applied Physics Letters AIP USA, Nov. 24, 1997, pp. 3174-3176.
Xiaoyun Sun et al., “Multilayer resist methods for nanoimprint lithography on nonflat surfaces”, XP002330221, AIP for American Vacuum Society USA, Nov. 6, 1998, pp. 3922-3924.
Bao L-R et al., “Nanoimprinting over topography and multilayer three-dimensional printing”, XP002330222, AIP for American Vacuum Society USA., Nov. 6, 2002, pp. 2881-2885.
Database WPI, Section CH, week 200122, Derwent Publications Ltd., Class A89; XP002312856, Dec. 19, 2000.
Bacon & Thomas PLLC
Giesecke & Devrient GmbH
Schilling Richard L.
LandOfFree
Method for producing an exposed substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing an exposed substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing an exposed substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3781634