Method for producing an aperture comprising an oxidized region a

Details Method for producing an aperture comprising an oxidized region a Method for producing an aperture comprising an oxidized region a

1997-11-05

1999-11-16

Mulpuri, Savitri

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

438 41, 438 44, H01L 2120

Patent

active

059856831

ABSTRACT:
A method for fabricating an improved aperture is provided in which an oxidizable layer is deposited on a substrate, a mask is deposited in a first region over the oxidizable layer to leave a second region exposed, the oxidizable layer in the second region is removed, additional non-oxidizable material is deposited over the second region, a side wall of the oxidizable region is exposed, and the oxidizable layers is oxidized to form an oxidized region in at least a portion of the first region.

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