Coating processes – Electrical product produced – Electron emissive or suppressive
Patent
1995-10-24
1997-12-02
Beck, Shrive
Coating processes
Electrical product produced
Electron emissive or suppressive
427124, 4272481, 427250, 427160, 427282, 427267, 378143, C23C 1606
Patent
active
056933630
ABSTRACT:
This invention relates to an anode for use in an X-ray tube and a method of manufacturing the anode, and to a stationary anode X-ray tube. An anode base formed of copper or the like includes a recess formed in an end surface thereof and having an upwardly diverging inner peripheral wall. An anode target material such as tungsten is directly deposited in the recess by chemical vapor deposition.
REFERENCES:
patent: 3887723 (1975-06-01), Kaplan et al.
patent: 4185365 (1980-01-01), Hueschen et al.
patent: 4400824 (1983-08-01), Shidara
patent: 4920012 (1990-04-01), Woodruff et al.
patent: 4939762 (1990-07-01), Baba et al.
Patent Abstracts of Japan, vol. 001 No. 304 (E-545), 3 Oct. 1987, & JP-A-62 097240 (Toshiba Corp) 6 May 1987.
Hiraishi Masahiro
Kuroda Shin-ichi
Yamanishi Keiichi
Beck Shrive
Meeks Timothy
Shimadzu Corporation
LandOfFree
Method for producing an anode for an X-ray tube using chemical v does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing an anode for an X-ray tube using chemical v, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing an anode for an X-ray tube using chemical v will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-799378