Method for producing an air flow rate meter substrate

Details Method for producing an air flow rate meter substrate Method for producing an air flow rate meter substrate

1990-04-27

1991-07-09

Lawrence, Evan

Coating processes

Electrical product produced

Resistor for current control

427284, 4274432, B05D 512, B05D 118

Patent

active

050304798

ABSTRACT:
A method for producing an air flow rate meter substrate which includes at least one resistive film on one side of the substrate with a teardrop end face that faces the direction of air flow to be determined, formed by dipping the face end of the substrate into a liquid plastic or a lacquer composition.

REFERENCES:
patent: 3243867 (1966-04-01), Bernstein
patent: 3817782 (1974-06-01), Klein et al.
patent: 3900819 (1975-08-01), Djorup
patent: 4300391 (1981-11-01), Eiermann
patent: 4307129 (1981-12-01), Nisigahana
patent: 4833912 (1985-05-01), Ohta et al.

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