Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2007-07-17
2007-07-17
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S041000, C216S058000, C438S007000, C438S009000, C438S725000, C438S733000, C365S132000
Reexamination Certificate
active
09462283
ABSTRACT:
“A process for fabricating active and passive, polymer-based components for use in integrated optics. As a result of this process, active and passive optoelectronic components of a high quality having a high level of integration and high packing density are fabricated. A patternable polymer resist layer of a high quality is deposited onto an optoelectronic component. An etching mask is used in conjunction with a high-grade anisotropic deep etching to produce a pattern, which is filled with monomers through gas-phase or liquid-phase diffusion. The optical properties of the optical component can be selectively changed as a function of the type of monomers used for the diffusion, as well as of the temperature and application time. The process makes it possible to increase the packing density of future integrated monomode optics and simultaneously produce large quantities in a cost-effective manner.”
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Ahmed Shamim
Deutsche Telekom AG
Kenyon & Kenyon LLP
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