Method for producing a silicon thin film transistor

Details Method for producing a silicon thin film transistor Method for producing a silicon thin film transistor

1990-03-15

1991-12-10

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437101, 357 237, H01L 21336

Patent

active

050717790

ABSTRACT:
A silicon thin film transistor array includes a plurality of silicon thin film transistors in an array-like form, each silicon thin film transistor including an insulating substrate, a gate electrode formed on the insulating substrate, a gate insulating layer formed on the insulating substrate containing the gate electrode, a pair of first impurity contained silicon layers formed on the gate insulating layer in such a manner as to transversely cross a terminal part of the gate electrode, an intrinsic silicon layer formed on the pair of first impurity contained silicon layers and on the gate insulating layer between the pair of first impurity contained silicon layers in such a manner as to connect the pair of first impurity contained silicon layers, a protective insulation layer formed on the intrinsic silicon layer, and a source electrode and a drain electrode formed at contact parts of the pair of first impurity contained silicon layers; gate wiring for connecting the gate electrodes of the silicon thin film transistors to each other; and source wiring for connecting the source electrodes of the silicon thin film transistors to each other.

REFERENCES:
patent: 4601097 (1986-07-01), Shimbo
patent: 4700458 (1987-10-01), Suzuki et al.
patent: 4888632 (1989-12-01), Haller
patent: 4894690 (1990-01-01), Okabe et al.
patent: 4918504 (1990-04-01), Kato et al.

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