Method for producing a silica mask on metal oxide surface

Details Method for producing a silica mask on metal oxide surface Method for producing a silica mask on metal oxide surface

1994-06-15

1995-11-14

Utech, Benjamin

Coating processes

Heat decomposition of applied coating or base material

427248, 427256, 427272, 427273, 427282, B05D 302

Patent

active

054664837

ABSTRACT:
A method for producing a silica mask on metal oxide surface is disclosed. Benzaldehyde is adsorbed on neutral or weak alkaline metal oxide surface, and then tetra-methoxy silane is deposited. The tetra-methoxy silane is hydrolyzed by water vapor into silica and the adsorbed benzaldehyde is removed by NH3 as benzo-nitrile. Thus a silica mask is produced on the metal oxide surface, and the mask has vacancies corresponding to the removed benzaldehyde. The vacancies act as the adsorption sites for shape selective adsorption.

REFERENCES:
patent: 3592707 (1971-07-01), Jaccodine
patent: 3880675 (1975-04-01), Tarui et al.
patent: 3964906 (1976-06-01), Kenney
patent: 4041190 (1977-08-01), Dubois et al.
patent: 4053351 (1977-10-01), De Forest et al.
patent: 4332837 (1982-06-01), Peyre-Lavigne
Niwa et al., Applied Catalysis, "Benzaldehyde-amminia titration method for discrimination between surfaces of metal oxide catalysts", 67 (1991) pp. 297-305.
The Proceeding of 72th Catalyst Conference (A), Sep. 28-30, 1993.

Affiliated with

Also associated with

Rating

Method for producing a silica mask on metal oxide surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing a silica mask on metal oxide surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a silica mask on metal oxide surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1219463