Glass manufacturing – Processes – With shaping of particulate material and subsequent fusing...
Patent
1997-09-11
1999-06-01
Griffin, Steven P.
Glass manufacturing
Processes
With shaping of particulate material and subsequent fusing...
65 63, 65111, 65117, C03B 2000, C03C 304, C03C 306
Patent
active
059084820
ABSTRACT:
A silica glass has a structure determination temperature of 1200K or lower and a hydrogen molecule concentration of 1.times.10.sup.17 molecules/cm.sup.3 or more. The silica glass is used together with light in a wavelength region of 400 nm or shorter. The silica glass is produced by heating a silica glass ingot having a hydrogen molecule concentration of 1.times.10.sup.17 molecules/cm.sup.3 or more to a temperature of 1200-1350K, retaining the ingot at that temperature for a given period of time, and then, cooling the ingot to a temperature of 1000K or lower at a temperature-lowering rate of 50K/hr or less to anneal the ingot.
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Hiraiwa Hiroyuki
Komine Norio
Griffin Steven P.
Nikon Corporation
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