Compositions – Electrically conductive or emissive compositions – Free metal containing
Patent
1995-08-14
1997-12-23
McGinty, Douglas J.
Compositions
Electrically conductive or emissive compositions
Free metal containing
252514, 252512, 252518, 252519, 252520, 252516, 252521, 427249, 427255, 528 15, 528 16, 528 17, 528 14, 528 18, 528 19, H01B 104, H01B 102, C23C 1624, C23C 1632
Patent
active
057004005
ABSTRACT:
A method for producing a semiconducting material by subjecting a hydrosilane monomer to dehydrogenative condensation followed by thermal decomposition is disclosed. The hydrosilane monomer may be a hydromonosilane, a hydrodisilane or a hydrotrisilane. The dehydrogenative condensation is conducted in the presence of a catalyst that contains at least one metal or metal compound of Groups 3B, 4B and 8 of the Periodic Table. The catalyst may be used in conjunction with a silane compound or a metal hydride. The semiconducting material that is formed may have a silicon content of 70 atomic % or more.
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Ikai Keizo
Matsuno Mitsuo
Minami Masaki
McGinty Douglas J.
Nippon Oil Co. Ltd.
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