Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...
Patent
1983-01-19
1986-03-18
Childs, Sadie L.
Coating processes
Coating by vapor, gas, or smoke
Base includes an inorganic compound containing silicon or...
4272553, 4273762, 4274192, 4274193, C23C 1600
Patent
active
045768366
ABSTRACT:
A refractory fibrous preform in ceramic material is placed inside an infiltration chamber where it is heated within a reacting gaseous mixture introduced into the chamber and containing at least one gaseous hydrolyzing or oxidizing agent and a volatile hydrolyzable or oxidizable compound of the one element or of each element of which the oxide is a constituent of the matrix of the structure to be produced, in order to obtain by chemical reaction an adhesive deposit of said oxide or oxide constituting said matrix and having a melting point higher than 1750.degree. C.; the values of the overall pressure, of the temperature and of the gas flow rates inside the infiltration chamber are selected to be at a level slightly higher than the minimum values necessary for producing the said chemical reaction, so as to enable the constituents of the gaseous reaction mixture to penetrate to the bottom of the pores in the fibrous preform before having reacted completely such that the pores are densified throughout their length with the adhesive deposit.
REFERENCES:
patent: 2578956 (1951-12-01), Weinrich
patent: 3386918 (1966-06-01), Hough et al.
patent: 4205032 (1980-05-01), Walters et al.
patent: 4252588 (1981-02-01), Kratsch et al.
patent: 4325930 (1982-04-01), Vallet
British Patent Application No. 2,053,873-Intl. Cl. No. C01B 31/00-dated Feb. 11, 1981.
A D Report by Philip Wong, et al., entitled Chemical Vapor Deposition of Polycrystalline Aluminum Oxide, Oct. 1969.
Colmet Robert
Hagenmuller Paul
Lamico Pierre
Naslain Roger
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