Method for producing a reflective surface on a substrate

Details Method for producing a reflective surface on a substrate Method for producing a reflective surface on a substrate

1993-02-11

1994-03-15

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427250, 4272551, 4272556, 4272557, 427296, 427491, 427509, 427515, 427585, B05D 306

Patent

active

052944646

ABSTRACT:
A process gas atmosphere consisting essentially of (a) organosiloxanes and inert gas, or (b) pure silane or (c) silane plus inert gas is introduced into a vacuum chamber and exposed to microwaves to produce an electro-cyclotron resonance in a plasma for coating substrates. The process is useful for producing an adherent coating on a plastic substrate, especially an intermediate coating for a reflective coating in an automotive headlamp.

REFERENCES:
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patent: 4569738 (1986-02-01), Kieser et al.
patent: 4776298 (1988-10-01), Nied
patent: 4956196 (1990-09-01), Wagner et al.
patent: 5093152 (1992-03-01), Bonet et al.
Sakata et al., Plasma Polymerized Membranes Journal of Applied Polymer Science, (no month available 1986), vol. 31, 1999-2006.
Inagaki et al. Glow Discharge Polymerization of Tetramethylsilane, (no month available 1983), Applied Polymer Sci., vol. 28, 3629-3640.
Liebel, Erfahrungen mit der Plasmavorbehandlung, Metalloberflache 45, (no month available 1991), 10, pp. 443-449.

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