Method for producing a photomask

Details Method for producing a photomask Method for producing a photomask

1997-06-10

1998-12-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

058517022

ABSTRACT:
A method for producing a photomask of the present invention includes the steps of: forming a light-blocking film on a surface of a transparent substrate; forming a resist film for an EB on the light-blocking film; patterning the resist film by EB writing and development; and selectively etching the light-blocking film using the patterned resist film to form a photomask, wherein the light-blocking film has a thickness in the range of about 60 nm to about 70 nm.

REFERENCES:
patent: 5658826 (1997-08-01), Chung
"Mask Fabrication," D.J. Elliott, Integrated Circuit Fabrication Technology, 2.sup.nd Ed., McGraw Hill, 1989.

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