Method for producing a photomask

Details Method for producing a photomask Method for producing a photomask

1974-10-09

1976-06-29

Powell, William A.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 383, 156 13, 156 15, 252 793, 355125, 355133, G03C 500, C09K 1308, C23F 102, G03B 2700

Patent

active

039664732

ABSTRACT:
A method for producing a photomask by exposing and development-processing a photographic light-sensitive material including a transparent support having thereon a masking layer and a silver halide emulsion layer to thereby form silver image areas, etch-bleaching the silver halide emulsion layer to thereby remove the silver image areas to uncover the masking layer thereunder, subjecting the coated support to etching to etch the uncovered masking layer with a mixed solution containing hydrofluoric acid and ammonium fluoride to thereby uncover the transparent support thereunder, and then removing the non-silver image areas to thereby reveal the masking layer.

REFERENCES:
patent: 3474021 (1969-10-01), Davidse et al.
patent: 3561963 (1971-02-01), Kiba
patent: 3567446 (1971-03-01), Gleadle
patent: 3669665 (1972-06-01), Faigenbaum et al.
patent: 3674492 (1972-07-01), Goldrick et al.
patent: 3744904 (1973-07-01), Loprest et al.
patent: 3754913 (1973-08-01), Takeuchi et al.
patent: 3765901 (1973-10-01), Schellekens

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