Method for producing a packaged integrated circuit

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor

Reexamination Certificate

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Details

C257S522000, C438S012000, C438S013000, C438S039000, C438S040000, C438S042000, C438S043000, C438S044000, C438S115000, C438S458000, C438S459000, C438S626000, C438S632000, C438S633000, C438S689000, C438S659000, C438S940000, C438S963000, C438S977000, C438S690000, C438S660000, C438S781000, C438S799000

Reexamination Certificate

active

07465977

ABSTRACT:
There is described a method for producing a packaged integrated circuit. The method comprises a first step of building an integrated circuit having a micro-structure suspended above a micro-cavity, and having a heating element on the micro-structure capable of heating itself and its immediate surroundings. A layer of protective material is then deposited on said micro-structure such that at least a top surface of the micro-structure and an opening of the micro-cavity is covered, wherein the protective material is in a solid state at room temperature and can protect the micro-structure during silicon wafer dicing procedures and subsequent packaging. The integrated circuit is packaged and an electric current is passed through the heating element such that a portion of the protective material is removed and an unobstructed volume is provided above and below the micro-structure.

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Grudin et al., “Microstructure Release and Test Techniques for High-Temperature Micro Hotplate”, Electrical and Computer Engineering, 1999, IEEE Canadian Conference on Edmonton, Alberta, CA, May 9-12, 1999, pp. 1610-1615.

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