Method for producing a metallization level having contacts and i

Details Method for producing a metallization level having contacts and i Method for producing a metallization level having contacts and i

1993-12-16

1995-06-06

Chaudhari, Chandra

Fishing, trapping, and vermin destroying

437229, 148DIG50, H01L 21441

Patent

active

054223091

ABSTRACT:
An insulating layer wherein contact holes to regions to be contacted are opened is applied surface-wide onto a substrate. For producing an interconnect mask, a photoresist layer is applied, exposed and developed such that the surface of the regions to be contacted remains covered with photoresist in exposed regions, whereas the surface of the insulating layer is uncovered in the exposed regions. Using the interconnect mask as etching mask, trenches are etched into the insulating layer. Contacts and interconnects of a metallization level are finished by filling the contact holes and the trenches with metal.

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