METHOD FOR PRODUCING A GRID STRUCTURE, AN OPTICAL ELEMENT,...

Optical waveguides – With optical coupler – Input/output coupler

Reexamination Certificate

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Reexamination Certificate

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06873764

ABSTRACT:
A coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, a substrate (1) is covered with a photoresist layer (10) and exposed for instance at the Lithrow angle (ΘL) or at 0° to a mercury-vapour lamp (11) via a folding mirror (13, 13′) through a phase mask (14) in the near field of which the photoresist layer is arranged, then structured by reactive ion etching and provided with a transparent layer by reactive DC magnetron sputtering, particularly pulsed DC sputtering or AC-superimposed DC sputtering. The phase mask (14) is structured in advance with the laser two-beam interference method. The process is particularly suited for the production of optical elements, particularly evane-scent field sensor plates and optical couplers for communications technology which can be employed in particular as filters for wavelength multiplexing in fibre-optic networks.

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patent: 5822472 (1998-10-01), Danielzik et al.
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patent: 0 602 829 (1994-06-01), None
Day et al., “Filter-Response Line Shapes of Resonant Waveguide Gratings,” Journal of Lightwave Technology, US, IEEE, NY, Aug. 1, 1996, pp. 1815-1824.
Dubendorger et al, “Compact Integrated Optical Immunosensor using Replicated Chirped Coupling Grating Sensor Chips,” Applied Optics, 37/10, Apr. 1, 1998.

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