Method for producing a conducting doped diamond-like...

Details Method for producing a conducting doped diamond-like... Method for producing a conducting doped diamond-like...

2007-05-29

2007-05-29

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C427S248100, C427S249100, C427S331000, C427S372200, C427S379000

Reexamination Certificate

active

10208801

ABSTRACT:
The present invention provides a method for producing a conducting doped diamond-like nanocomposite film containing, as basic elements, carbon, silicon, metal, oxygen and hydrogen. The film is produced as follows: a substrate is disposed in a vacuum chamber, and a voltage of 0.3-5.0 kV is applied to the substrate; a gas discharge plasma with an energy density of more than 5 kilowatt-hour/gram-atom of carbon particles is generated, and an organosiloxane compound is evaporated into the plasma; a beam of particles of a dopant is introduced into the plasma; and a film is grown on the substrate to produce a conducting doped carbon nanocomposite film with a predetermined relationship of atomic concentrations of carbon, metal and silicon. The film surface is coated with a silicon dioxide layer. A unidirectional alternating current is passed through the film in a current generator mode to effect electric thermal exposure of the film. As the result, a conducting doped diamond-like nanocomposite film having a multilayer structure is produced.

REFERENCES:
patent: 5182093 (1993-01-01), Cann
patent: 5352493 (1994-10-01), Dorfman et al.
patent: 5385762 (1995-01-01), Prins
patent: 5981000 (1999-11-01), Grill et al.

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