Method for producing a cathode material containing silver and bi

Compositions – Electrically conductive or emissive compositions – Metal compound containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423 42, 423593, 429219, H01B 100, C01G 500, C01G 2900

Patent

active

055891098

ABSTRACT:
Solid divalent silver oxide is reacted in hot aqueous alkaline reaction medium with a solid bismuth component and a reducing agent. The reaction product comprises a novel compound containing silver, bismuth, and oxygen, which is used in making cathode pellets for use in alkaline electrochemical cells. The cells exhibit low internal impedance and substantially single voltage discharge characteristic of monovalent silver oxide while retaining a significant portion of the coulombic capacity a of divalent silver cathode, without toxicity problems attendant cathodes containing lead and/or cadmium.

REFERENCES:
patent: 4003757 (1977-01-01), Lux et al.
patent: 4015056 (1977-03-01), Megahed et al.
patent: 4078127 (1978-03-01), Megahed et al.
patent: 4297249 (1981-10-01), Przybyla et al.
patent: 4835077 (1989-05-01), Megahed et al.
Chemical Abstract 105:15676K, 1986, no month.
Chemical Abstract 115:84023p, 1991, no month.
Abstract of Japan Patent 73-014838, 1973, no month.
Goodenough et al, "Exploring the A.sup.+ B.sup.5+ O.sub.3 Compounds," J. Solid State Chem., vol. 6 No. 4, Apr. 1973.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for producing a cathode material containing silver and bi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing a cathode material containing silver and bi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a cathode material containing silver and bi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1139689

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.