Chemistry of inorganic compounds – Silicon or compound thereof – Halogen containing
Patent
1989-02-17
1991-11-19
Chaudhuri, Olik
Chemistry of inorganic compounds
Silicon or compound thereof
Halogen containing
405129, 423343, 423348, 423488, C01B 33107, C01B 3308
Patent
active
050664727
ABSTRACT:
Disclosed is a method for the processing of the residues that occur in the production of chlorosilane. The processing is performed by the separation of the residual chlorosilanes, followed by hydrolysis of these residues with water vapor. The water vapor used has a temperature between 100.degree. and 300.degree. C. and additionally contains hydrogen chloride. The hydrolysis residues occurring in the present method have an extremely small chloride content and can be transported, if desired, directly to a dump. The hydrogen chloride that is released can be absorbed in water and removed as hydrochloric acid or can be desorbed for further technical use. Preferably it is reused for chlorosilane production.
REFERENCES:
patent: 3878291 (1975-04-01), Keller et al.
patent: 4217334 (1980-08-01), Weigert et al.
patent: 4340574 (1982-07-01), Coleman
patent: 4368181 (1983-01-01), Suzuki et al.
patent: 4490343 (1984-12-01), Glembin et al.
patent: 4519999 (1985-05-01), Coleman et al.
Websters Ninth New Collegiate Dictionary, p. 1003.
Elements of Fractional Distillation, Robinson et al., 1950, p. 190.
Falk Bernhard
Gratz Werner
Ruff Klaus
Chaudhuri Olik
Horton Ken
Huels Aktiengesellschaft
LandOfFree
Method for processing the residues of a chlorosilane distillatio does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for processing the residues of a chlorosilane distillatio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for processing the residues of a chlorosilane distillatio will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1368885