Method for processing superconducting thin films

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Producing josephson junction – per se

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505728, 505410, 156628, 156643, 156644, 156651, 156656, 20419235, 252 791, B05D 500

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053568702

ABSTRACT:
An ion beam is irradiated to an oxide superconducting thin film formed on a substrate to disturb the crystal structure of the superconducting thin film and thus forming a damaged layer. The damaged layer has higher solubility in a halogen solution has a faster etching rate than other portions. Then, the superconducting thin film is etched by using a halogen solution to remove the damaged layer and form a groove at that portion. As a result, a groove of a desired form can be provided efficiently.

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patent: 5227364 (1993-07-01), Fujiwara et al.
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