Method for processing substrate materials by means of plasma tre

Details Method for processing substrate materials by means of plasma tre Method for processing substrate materials by means of plasma tre

1980-03-14

1981-09-29

Gantz, Delbert E.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

118715, 156345, 156643, 156646, 204192E, 204298, 250531, 427 38, H01L 21306

Patent

active

042921538

ABSTRACT:
A method for processing substrate materials by uniform plasma treatment, including the steps of mounting substrate materials onto a series of electrode plates arranged in parallel, alternately connecting the electrode plates to a pair of bus lines, applying a high-frequency power between the bus lines for producing plasma between the electrode plates, changing the feed points of the high-frequency power on the pair of bus lines so that the plasma treatment is effected substantially uniformly in the different spaces between the several electrode plates.

REFERENCES:
patent: 3450617 (1969-06-01), Hellund
patent: 3875068 (1975-04-01), Mitzel
patent: 3971684 (1976-07-01), Muto
patent: 3984301 (1976-10-01), Matsuzaki et al.
patent: 4178877 (1979-12-01), Kudo

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