Method for processing residues from the distillation of chlorosi

Chemistry of inorganic compounds – Miscellaneous process

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423488, 423336, 588226, 588248, C01B 3300, A64D 300

Patent

active

051820951

ABSTRACT:
A residue from the production of chlorosilanes from raw silicon is treated with steam and aditionally with nitrogen-oxygen mixtures. The resulting residue has a lower chloride content.

REFERENCES:
patent: 1865797 (1932-07-01), Shiffler
patent: 2161641 (1973-06-01), Weller et al.
patent: 3878291 (1975-04-01), Keller et al.
patent: 3980758 (1976-09-01), Krumbock et al.
patent: 4867960 (1989-09-01), Tom
patent: 5008098 (1991-04-01), Bernadner et al.
patent: 5066472 (1991-11-01), Ruff et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for processing residues from the distillation of chlorosi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for processing residues from the distillation of chlorosi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for processing residues from the distillation of chlorosi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1411651

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.