Method for processing optical proximity correction

Details Method for processing optical proximity correction Method for processing optical proximity correction

2008-10-30

2011-10-18

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Analysis and verification

C716S054000, C716S055000

Reexamination Certificate

active

08042068

ABSTRACT:
A method for processing optical proximity correction includes preparing a chemical mechanical polishing (CMP) map; extracting calibration data depending on a focus degree with the CMP map; and correcting optical proximity with the calibration data.

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Notice of Rejection for Korean Patent Application No. 10-2008-0023550, dated Mar. 5, 2009.

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