Method for processing one-dimensional nano-materials

Details Method for processing one-dimensional nano-materials Method for processing one-dimensional nano-materials

2005-05-17

2005-05-17

Blum, David S. (Department: 2813)

Semiconductor device manufacturing: process

Electron emitter manufacture

C438S666000

Reexamination Certificate

active

06893886

ABSTRACT:
A method for processing one-dimensional nano-materials includes the following steps: providing a substrate (11); forming one-dimensional nano-materials (12) on the substrate, the one-dimensional nano-materials being substantially parallel to each other and each being substantially perpendicular to the substrate, the one-dimensional nano-materials cooperatively defining a top surface distal from the substrate; and applying physical energy (14) by means of a high-energy pulse laser beam to the top surface of the one-dimensional nano-materials. The resulting one-dimensional nano-materials have sharp, tapered tips (15, 15′). Distances between adjacent tips are approximately uniform, and are relatively large. This reduces shielding between adjacent one-dimensional nano-materials. The tips also contribute to a decreased threshold voltage required for field emission by the one-dimensional nano-materials.

REFERENCES:
patent: 6383923 (2002-05-01), Brown et al.
patent: 6719841 (2004-04-01), Chen et al.
patent: 6741019 (2004-05-01), Filas et al.

Affiliated with

Also associated with

Rating

Method for processing one-dimensional nano-materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for processing one-dimensional nano-materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for processing one-dimensional nano-materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3432351